Products / Thermal Management Diamond

Thermal Management Diamond

Diamond offers the highest known thermal conductivity (up to 2200 W/m·K at room temperature), enabling lower junction temperature, higher power density, improved reliability, and extended lifetime for high-power and high-density devices.

Thermal Management Diamond

Single-Crystal Diamond Substrates

Ultra-high thermal conductivity substrates with excellent surface quality, compatible with GaN, SiC and Si platforms.

Core Points

Series 01
Ultra-high k Low CTE Mechanical stability Die attach Metallization High hardness Device integration Hermetic packaging

Core Parameters

Growth methodMPCVD
Thermal conductivity @300KUp to 2200 W/m·K
Thermal expansion coefficient1.1 ppm/K
Hardness~80 GPa
Density3.52 g/cm³
Dimensions5×5 / 10×10 / 15×15 mm²
Thickness0.1–1 mm
Surface roughnessRa ~ 1 nm
Typical TTV≤ 10 μm
Metallization optionsTi/Pt/Au · Cr/Ni/Au (patterned & through-holes available)
Single-Crystal Diamond Substrates

Polycrystalline Diamond Wafers

Wafer-level polycrystalline diamond for large-format integration: RF/5G & 6G, high-power GaN/SiC modules, lasers, and photonics.

Core Points

Series 02
Wafer-level integration Large format High k RF / 5G / 6G GaN / SiC modules Laser heat spreaders Photonics Quantum devices

Core Parameters

Growth methodMPCVD
Thermal conductivity @300K1500–1800 W/m·K
Thermal expansion coefficient1.1 ppm/K
Hardness~81 GPa
Density3.52 g/cm³
Wafer sizeØ 50–100 mm
Thickness0.05/ 0.1/ 0.3 / 0.38 / 0.5 mm
Surface roughnessRa ~ 5 nm
Typical TTV≤ 20 μm
Polycrystalline Diamond Wafers

High-Performance Diamond Thermal Solution

“Illustrated here as an example”: Metallized single-crystal diamond bonded to a copper base for exceptional heat dissipation and stable, device-ready integration.

Core Points

Series 03
Metallized diamond Cu base bonded Lower junction temperature Device-ready High reliability Stable performance Aging tests High precision

Core Parameters

StructureMetallized single-crystal diamond + copper base
PurposeHigh-efficiency heat spreading and thermal stability
IntegrationDesigned for seamless integration with customer devices
Use casesOptoelectronic component aging tests · high-precision applications
High-Performance Diamond Thermal Solution

Diamond–Copper Composite Heat Spreaders

Diamond/Cu composites combine diamond thermal performance with copper conductivity and machinability, enabling custom shapes and large dimensions.

Core Points

Series 04
High k Machinable Electrical conductivity Large dimensions Custom cavities Thermal shock Plating options Precision machining

Core Parameters

Diamond–Copper (63% diamond)k > 550 W/m·K (max > 700) · CTE 6–8 ppm/K · Flexural > 300 MPa
Electrical conductivityIACS 20%
Thermal shock−65°C to +150°C, 200 cycles
Thermal degradation< 5% (final conductivity > 600 W/m·K)
Surface roughness< 1 μm
Available dimensions2×2 mm² to 400×400 mm²
Plating optionsNi (4 μm) / Au (> 1.3 μm)
CustomizationCustom shapes, cavities, high-precision machining
Diamond–Copper Composite Heat Spreaders

Discuss Your Requirement

Contact us to define the optimal thermal management diamond solution for your device platform.